A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

• (500 nm)/Si(111) In this experiment, 4 × 4 µm2 FEBID structures were written with [Au(CH3)2Cl]2 as the precursor using an acceleration voltage of 5 keV and a beam current of 1.5 nA. The fabricated structures were examined with scanning electron microscopy (SEM) and Auger electron spectroscopy (AES

• three experiments. The FEBID structures were investigated by SEM and noncontact atomic force microscopy (AFM). Figure 3a shows the SEM images of the deposits along with the respective deposition parameters. Magnified sections from these SEM images are shown in Figure 3b. Auger electron spectroscopy was

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

• Christian Preischl,
• Linh Hoang Le,
• Elif Bilgilisoy,
• Armin Gölzhäuser and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2021, 12, 319–329, doi:10.3762/bjnano.12.26

• lithography application based on LabView 8.6 (National Instruments) and a high-speed DAC PCIe card (M2i.6021-exp, Spectrum GmbH, Germany). SEM images were acquired with SmartSEM (Zeiss) and are shown with minor contrast and brightness adjustments only. For Auger electron spectroscopy the electron beam of the

Electron beam-induced deposition of platinum from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

• Aya Mahgoub,
• Hang Lu,
• Rachel M. Thorman,
• Konstantin Preradovic,
• Titel Jurca,
• Lisa McElwee-White,
• Howard Fairbrother and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2020, 11, 1789–1800, doi:10.3762/bjnano.11.161

• for complete precursor decomposition [14]. Electron-induced decomposition of adsorbed Pt(CO)2Cl2 has been previously studied using X-ray photoelectron spectroscopy (XPS) and mass spectrometry, and some deposits were produced in the ultrahigh vacuum (UHV) environment of an Auger electron spectroscopy

Interaction of Te and Se interlayers with Ag or Au nanofilms in sandwich structures

• Arkadiusz Ciesielski,
• Lukasz Skowronski,
• Marek Trzcinski,
• Ewa Górecka,
• Wojciech Pacuski and
• Tomasz Szoplik

Beilstein J. Nanotechnol. 2019, 10, 238–246, doi:10.3762/bjnano.10.22

• selenium line 3d is over 13 times smaller than the RSF of the 3d line of tellurium. This means that small concentrations of selenium are much less detectable by the XPS, therefore Auger electron spectroscopy has to be used. The case of layers containing mostly silver or gold is even more difficult because

Synthesis of carbon nanowalls from a single-source metal-organic precursor

• André Giese,
• Sebastian Schipporeit,
• Volker Buck and
• Nicolas Wöhrl

Beilstein J. Nanotechnol. 2018, 9, 1895–1905, doi:10.3762/bjnano.9.181

• the various deposition parameters on the growth. Silicon, stainless steel, nickel and copper are used as substrate materials. The CNWs deposited are characterized by scanning electron microscopy (SEM), Raman spectroscopy and Auger electron spectroscopy (AES). The combination of bias voltage, the

• nucleation density and the fact that the curled CNWs are much thinner, which, again, leads to higher structures. Scanning Auger electron spectroscopy (AES) was used to obtain the chemical mappings of the cross sections of the films. Since the CNWs are synthesized from an aluminium-containing precursor, the

• triangles: data points taken from [34]. Heights of CNWs as a function of process parameters and substrate material. a) SEM image of the curled CNWs and corresponding b) carbon and c) aluminium mappings, as measured by Auger electron spectroscopy. EDX spectrum of CNWs on stainless steel (Fe, Cr). Besides

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• condition of the Ta substrate was monitored by Auger electron spectroscopy (STAIB DESA 100). Prior to an experiment, the substrate was sputter-cleaned using Ar+ ions at 3 keV until the Auger signals of the underlying Ta were clearly visible. Immediately before the precursor deposition, adsorbed volatile

Transition from silicene monolayer to thin Si films on Ag(111): comparison between experimental data and Monte Carlo simulation

• Alberto Curcella,
• Romain Bernard,
• Yves Borensztein,
• Silvia Pandolfi and
• Geoffroy Prévot

Beilstein J. Nanotechnol. 2018, 9, 48–56, doi:10.3762/bjnano.9.7

• Alberto Curcella Romain Bernard Yves Borensztein Silvia Pandolfi Geoffroy Prevot Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7588, Institut des NanoSciences de Paris, F-75005, Paris, France 10.3762/bjnano.9.7 Abstract Scanning tunneling microscopy (STM), Auger electron spectroscopy (AES

• ], ARPES [31] and grazing incidence X-ray diffraction [32]. The diamond-like structure of the film has been confirmed by scanning tunneling microscopy (STM) [33] and optical measurements [34]. The Ag termination of the surface has been also demonstrated by Auger electron spectroscopy (AES) [34], metastable

• regime where multilayer silicene has been claimed to form (470–500 K), a good agreement is found with AES intensity variations and STM measurements within a Ag surfactant mediated growth, whereas a model with multilayer silicene growth fails to reproduce the AES measurements. Keywords: Auger electron

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• out at 1163 K, with the following precursor composition N2:H2:C2H4 (300:30:30 sccm). The chemical composition of Fe deposits before the CVD experiment was characterized by in situ Auger electron spectroscopy (AES) as depicted in Figure 1d. The investigated deposit (by EBID and AG) consists of Fe (≈87

• Omicron GmbH, Germany) at a base pressure of <2 × 10−10 mbar. The main component of the system is a UHV-compatible electron column (Leo Gemini), which allows for SEM (nominal resolution <3 nm) and combined with a hemispherical electron energy analyzer for local Auger electron spectroscopy (AES). All

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• from PtCl2 deposits created from cis-Pt(CO)2Cl2 by focused electron beam induced deposition (FEBID) is evaluated. Auger electron spectroscopy (AES) and energy-dispersive X-ray spectroscopy (EDS) measurements as well as thermodynamics calculations support the idea that electrons can remove chlorine from

• present in the platinum-containing precursors (MeCpPtMe3, Pt(hfac)2, and Pt(PF3)4) was also evaluated. Experimental FEBID structures were fabricated using two different systems: (i) a PHI 610 scanning Auger microprobe system (Auger electron spectroscopy (AES)), where deposits were subsequently treated

• either in situ with electrons or ex situ using AH, and (ii) a FIB Nova 200 dual beam microscope, where deposits were exposed ex situ to AO. Deposition, characterization and treatment of FEBID structures using Auger electron spectroscopy Details of the Auger electron spectroscopy (AES) chamber and its

Comprehensive Raman study of epitaxial silicene-related phases on Ag(111)

• Dmytro Solonenko,
• Ovidiu D. Gordan,
• Guy Le Lay,
• Dietrich R. T. Zahn and
• Patrick Vogt

Beilstein J. Nanotechnol. 2017, 8, 1357–1365, doi:10.3762/bjnano.8.137

• exceeds 1000 °C [30]. Such a low crystallization temperature is surprising, but it can be explained by metal mediation. For a layered Si–Ag system a temperature as low as 400 °C was reported [31]. These results are in agreement with Auger electron spectroscopy measurements [16] and low-energy electron

Anodization-based process for the fabrication of all niobium nitride Josephson junction structures

• Massimiliano Lucci,
• Ivano Ottaviani,
• Matteo Cirillo,
• Fabio De Matteis,
• Roberto Francini,
• Vittorio Merlo and
• Ivan Davoli

Beilstein J. Nanotechnol. 2017, 8, 539–546, doi:10.3762/bjnano.8.58

• decrease, respectively, from an average value of 5.9 GPa to 4.6 GPa and from 85 GPa to 78 GPa. The roughness of the oxidized surface was ±5 nm. To determine the chemical composition of the grown film we performed Auger electron spectroscopy (AES) and the spectra are shown in Figure 10. A complete nitrogen

• compliance voltage to obtain a controlled and stable oxidation of a NbN thin film. Auger electron spectroscopy and nano-indentation analysis has been employed to verify respectively the complete oxidation of the surface and the mechanical stability of the film. We have also found a relationship between the

• oxidized film grown on NbN. The total thickness of the oxide (TEXT + TINT) is higher than the initial thickness of NbN (TINT). Auger electron spectroscopy of the initial NbN sample before and after anodization. A soft surface cleaning process by Ar ion etching was performed before the measurements. From

NO gas sensing at room temperature using single titanium oxide nanodot sensors created by atomic force microscopy nanolithography

• Li-Yang Hong and
• Heh-Nan Lin

Beilstein J. Nanotechnol. 2016, 7, 1044–1051, doi:10.3762/bjnano.7.97

• around 257 × 103 nm3 and 24.2 × 103 nm2, respectively. The surface to volume ratio is roughly 0.094 nm−1. Therefore, sensor A has a larger surface to volume ratio. The generation of the NDs after nano-oxidation shown in Figure 2 is clear evidence of the formation of titanium oxide. Also, Auger electron

• spectroscopy analysis confirmed that the Ti was oxidized [32]. The compositions of the NDs, however, cannot be exactly determined and are simply TiOx. Also, sensor A has a larger resistance due to the smaller ND size. (The current–voltage relationships of the two ND sensors before NO sensing are shown in

Distribution of Pd clusters on ultrathin, epitaxial TiO_x films on Pt₃Ti(111)

• Christian Breinlich,
• Maria Buchholz,
• Marco Moors,
• Tobias Pertram,
• Conrad Becker and
• Klaus Wandelt

Beilstein J. Nanotechnol. 2015, 6, 2007–2014, doi:10.3762/bjnano.6.204

• experiments presented in this paper, was run at room temperature. The sample was prepared in an adjacent preparation chamber, which was equipped with a sputter gun, low energy electron diffraction (LEED) optics and an Auger electron spectroscopy (AES) analyser. The STM tips were electrochemically etched from

Lower nanometer-scale size limit for the deformation of a metallic glass by shear transformations revealed by quantitative AFM indentation

• Arnaud Caron and
• Roland Bennewitz

Beilstein J. Nanotechnol. 2015, 6, 1721–1732, doi:10.3762/bjnano.6.176

• careful Ar-sputtering for a duration of 5 min with an energy of 1 keV to remove its native oxide layer. Both Pt(111) and Pt57.5Cu14.7Ni5.3P22.5 metallic glass surfaces were characterized with Auger electron spectroscopy (AES) that confirmed the absence of surface contaminants such as C, H, S, and O. For

Surface excitations in the modelling of electron transport for electron-beam-induced deposition experiments

• Francesc Salvat-Pujol,
• Roser Valentí and
• Wolfgang S. Werner

Beilstein J. Nanotechnol. 2015, 6, 1260–1267, doi:10.3762/bjnano.6.129

• , including a number of spectroscopies (electron-energy-loss spectroscopy, X-ray photoelectron spectroscopy, and Auger-electron spectroscopy), electron microscopy, and the focused-electron-beam-induced deposition (FEBID) of nanostructures, on which we focus here. This technique employs beams of focussed

Magnetic properties of self-organized Co dimer nanolines on Si/Ag(110)

• Lisa Michez,
• Kai Chen,
• Fabien Cheynis,
• Frédéric Leroy,
• Alain Ranguis,
• Haik Jamgotchian,
• Margrit Hanbücken and
• Laurence Masson

Beilstein J. Nanotechnol. 2015, 6, 777–784, doi:10.3762/bjnano.6.80

• . For XMCD measurements, Co was deposited at 220 K on the silver substrate covered with the Si NR grating. The Co coverages in XMCD experiments have been estimated using combined measurements with Auger electron spectroscopy (AES), XAS at the Co L3 edge and STM. All STM images were obtained in the

Electron-beam induced deposition and autocatalytic decomposition of Co(CO)₃NO

• Florian Vollnhals,
• Martin Drost,
• Fan Tu,
• Esther Carrasco,
• Andreas Späth,
• Rainer H. Fink,
• Hans-Peter Steinrück and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

• , i.e., the Co-containing layer is only observed on the Fe structures while the pristine membrane remains uncovered. The composition of the Co-containing layers is most likely again CoOxNyCz, which is supported by the shift of the Co L3 peak to higher energy, and by Auger electron spectroscopy of

• comparable structures on SiOx/Si(100) (not shown); note that severe charging prevents Auger electron spectroscopy on the Si3N4 membrane samples. Figure 7 shows the optical density (left vertical axis) at the Co L3 edge and average apparent Co thickness dA (right vertical axis) of CoOxNyCz layers grown on

• than 3 nm), electron beam based lithography (EBL, EBID), local Auger electron spectroscopy (AES) and scanning Auger microscopy (SAM), with a resolution better than 10 nm using a hemispherical electron energy analyzer. All electron exposures for SEM and lithography were performed at a beam energy of 15

CoPc and CoPcF₁₆ on gold: Site-specific charge-transfer processes

• Fotini Petraki,
• Heiko Peisert,
• Johannes Uihlein,
• Umut Aygül and
• Thomas Chassé

Beilstein J. Nanotechnol. 2014, 5, 524–531, doi:10.3762/bjnano.5.61

• ) hexadecafluoro-phthalocyanine (CoPcF16) to gold are investigated by photo-excited electron spectroscopies (X-ray photoemission spectroscopy (XPS), ultraviolet photoemission spectroscopy (UPS) and X-ray excited Auger electron spectroscopy (XAES)). It is shown that a bidirectional charge transfer determines the

• mechanism [13][20]. The aim of the present work is a more comprehensive study of the interfacial charge transfer between CoPc or CoPcF16 and metals by using core level X-ray photoemission spectroscopy (XPS), X-ray excited Auger electron spectroscopy (XAES), valence band ultraviolet photoemission

• excited Auger electron spectroscopy (XAES) can be used as a tool to study the screening mechanism of holes at organic interfaces [19][23][24][25]. The different final states in XPS (one hole) and XAES (two holes) cause different binding energy (EB) shifts. Frequently, for the analysis of these shifts the